CC 800®/9 HiPIMS |
HiPIMS
HiPIMS represents the next step in the development of the standard pulse sputtering process, with which – by way of comparison – an almost 100% increase in ionization can be achieved.
Very high pulse currents at a relatively low average output achieve this effect. This is possible thanks to the high pulse-modulation ratio. The output is delivered to the cathode in the form of very short pulses by means of the HiPIMS output supply. In this way, pulse outputs in the medium-wave range are achieved at average device outputs.
For the coated substrate this procedure represents a very careful process.
The high-energy pulses lead to very high rates of ionization. The deposit rates of these can be used to improve the thicknesses and many other properties of the coating materials (e.g. adhesion, smoothness and structure) considerably compared with many conventional coating processes.
Advantages at a glance
Profit from our experience of many years as system manufacturer.
Please contact our customer adviser for further information.
Coating competence
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